Thanks for the help! I’m still trying to work through how I need to set things up. I’ve used the following node setup to try to generate the desired output:
However, this doesn’t quite give me the expected result. I should mention that the silicon nk plugged into the first thin film input has the n,k values for SiO2, and I 've varied D1 from 0-1000 with basically no change
For reference, I’m trying to recreate a wafer that I made:
The variation in color at the edges is from actual thickness variation, and the blue color is from the patterning step. The field oxide (green) should be ~550nm, and corresponds well with this chart. The blue portions should be ~120nm or so. If I wanted to model something like this physically according to my understanding of your node group, I would plug in a single SiO2 n,k group into the thin film input, and use the silicon n,k for my substrate, and by varying D1, I should be able to vary the observed color, in rough correspondence with the film thickness chart. I realize that it probably won’t correlate exactly, but as long as it’s close that’s good enough.
I’m clearly doing something wrong, but I can’t figure out what it is, I think largely due to my noobishness with the blender node setup.
Once again, thanks for working all of this out and being willing to help!